Degradation of Thiacloprid by ZnO in a Laminar Falling Film Slurry Photocatalytic Reactor
Само за регистроване кориснике
2013
Чланак у часопису (Објављена верзија)

Метаподаци
Приказ свих података о документуАпстракт
The possibility of the use of the laminar falling film slurry type photoreactor was examined in conjunction with ZnO as a photocatalyst for the removal of thiacloprid (TCL) from Calypso 480-SC commercial formulation by UV radiation. The degradation kinetics were monitored by HPLC DAD, while the disappearance of the nitrile group, i.e. TCL and intermediates containing this group, was followed by FTIR The study of TCL removal under different operating conditions indicated that 2 g/L of ZnO was an optimal catalyst loading, and the optimal pH was 6.8. In the investigated range of initial concentrations of TCL (0.05-0.38 mM), the photocatalytic degradation in the first stage of the reaction followed approximately a pseudo-first-order kinetics. The increase of LTV-light intensity resulted in a linear increase in the rate of TCL degradation. The figure-of-merit electrical energy per order was employed to estimate the electrical energy consumption. Because the efficiency of TCL photodegradatio...n in the natural thermal water was about two times lower than in distilled water, the investigation encompassed the influence of the thermal water components, i.e. different inorganic ions and humic acid, on the rate of TCL degradation.
Извор:
Industrial and Engineering Chemistry Research, 2013, 52, 14, 5040-5047Издавач:
- American Chemical Society (ACS)
Финансирање / пројекти:
- Развој метода праћења и уклањања биолошки активних супстанци у циљу унапређења квалитета животне средине (RS-172042)
- Наноструктурни функционални и композитни материјали у каталитичким и сорпционим процесима (RS-45001)
DOI: 10.1021/ie400194m
ISSN: 0888-5885
WoS: 000317548900010
Scopus: 2-s2.0-84876150818
Институција/група
IHTMTY - JOUR AU - Abramović, Biljana F. AU - Banic, Nemanja D. AU - Krstić, Jugoslav PY - 2013 UR - https://cer.ihtm.bg.ac.rs/handle/123456789/1355 AB - The possibility of the use of the laminar falling film slurry type photoreactor was examined in conjunction with ZnO as a photocatalyst for the removal of thiacloprid (TCL) from Calypso 480-SC commercial formulation by UV radiation. The degradation kinetics were monitored by HPLC DAD, while the disappearance of the nitrile group, i.e. TCL and intermediates containing this group, was followed by FTIR The study of TCL removal under different operating conditions indicated that 2 g/L of ZnO was an optimal catalyst loading, and the optimal pH was 6.8. In the investigated range of initial concentrations of TCL (0.05-0.38 mM), the photocatalytic degradation in the first stage of the reaction followed approximately a pseudo-first-order kinetics. The increase of LTV-light intensity resulted in a linear increase in the rate of TCL degradation. The figure-of-merit electrical energy per order was employed to estimate the electrical energy consumption. Because the efficiency of TCL photodegradation in the natural thermal water was about two times lower than in distilled water, the investigation encompassed the influence of the thermal water components, i.e. different inorganic ions and humic acid, on the rate of TCL degradation. PB - American Chemical Society (ACS) T2 - Industrial and Engineering Chemistry Research T1 - Degradation of Thiacloprid by ZnO in a Laminar Falling Film Slurry Photocatalytic Reactor VL - 52 IS - 14 SP - 5040 EP - 5047 DO - 10.1021/ie400194m ER -
@article{ author = "Abramović, Biljana F. and Banic, Nemanja D. and Krstić, Jugoslav", year = "2013", abstract = "The possibility of the use of the laminar falling film slurry type photoreactor was examined in conjunction with ZnO as a photocatalyst for the removal of thiacloprid (TCL) from Calypso 480-SC commercial formulation by UV radiation. The degradation kinetics were monitored by HPLC DAD, while the disappearance of the nitrile group, i.e. TCL and intermediates containing this group, was followed by FTIR The study of TCL removal under different operating conditions indicated that 2 g/L of ZnO was an optimal catalyst loading, and the optimal pH was 6.8. In the investigated range of initial concentrations of TCL (0.05-0.38 mM), the photocatalytic degradation in the first stage of the reaction followed approximately a pseudo-first-order kinetics. The increase of LTV-light intensity resulted in a linear increase in the rate of TCL degradation. The figure-of-merit electrical energy per order was employed to estimate the electrical energy consumption. Because the efficiency of TCL photodegradation in the natural thermal water was about two times lower than in distilled water, the investigation encompassed the influence of the thermal water components, i.e. different inorganic ions and humic acid, on the rate of TCL degradation.", publisher = "American Chemical Society (ACS)", journal = "Industrial and Engineering Chemistry Research", title = "Degradation of Thiacloprid by ZnO in a Laminar Falling Film Slurry Photocatalytic Reactor", volume = "52", number = "14", pages = "5040-5047", doi = "10.1021/ie400194m" }
Abramović, B. F., Banic, N. D.,& Krstić, J.. (2013). Degradation of Thiacloprid by ZnO in a Laminar Falling Film Slurry Photocatalytic Reactor. in Industrial and Engineering Chemistry Research American Chemical Society (ACS)., 52(14), 5040-5047. https://doi.org/10.1021/ie400194m
Abramović BF, Banic ND, Krstić J. Degradation of Thiacloprid by ZnO in a Laminar Falling Film Slurry Photocatalytic Reactor. in Industrial and Engineering Chemistry Research. 2013;52(14):5040-5047. doi:10.1021/ie400194m .
Abramović, Biljana F., Banic, Nemanja D., Krstić, Jugoslav, "Degradation of Thiacloprid by ZnO in a Laminar Falling Film Slurry Photocatalytic Reactor" in Industrial and Engineering Chemistry Research, 52, no. 14 (2013):5040-5047, https://doi.org/10.1021/ie400194m . .