The possibility of the use of the laminar falling film slurry type photoreactor was examined in conjunction with ZnO as a photocatalyst for the removal of thiacloprid (TCL) from Calypso 480-SC commercial formulation by UV radiation. The degradation kinetics were monitored by HPLC DAD, while the disappearance of the nitrile group, i.e. TCL and intermediates containing this group, was followed by FTIR The study of TCL removal under different operating conditions indicated that 2 g/L of ZnO was an optimal catalyst loading, and the optimal pH was 6.8. In the investigated range of initial concentrations of TCL (0.05-0.38 mM), the photocatalytic degradation in the first stage of the reaction followed approximately a pseudo-first-order kinetics. The increase of LTV-light intensity resulted in a linear increase in the rate of TCL degradation. The figure-of-merit electrical energy per order was employed to estimate the electrical energy consumption. Because the efficiency of TCL photodegradatio...n in the natural thermal water was about two times lower than in distilled water, the investigation encompassed the influence of the thermal water components, i.e. different inorganic ions and humic acid, on the rate of TCL degradation.
Source:
Industrial and Engineering Chemistry Research, 2013, 52, 14, 5040-5047
TY - JOUR
AU - Abramović, Biljana F.
AU - Banic, Nemanja D.
AU - Krstić, Jugoslav
PY - 2013
UR - https://cer.ihtm.bg.ac.rs/handle/123456789/1355
AB - The possibility of the use of the laminar falling film slurry type photoreactor was examined in conjunction with ZnO as a photocatalyst for the removal of thiacloprid (TCL) from Calypso 480-SC commercial formulation by UV radiation. The degradation kinetics were monitored by HPLC DAD, while the disappearance of the nitrile group, i.e. TCL and intermediates containing this group, was followed by FTIR The study of TCL removal under different operating conditions indicated that 2 g/L of ZnO was an optimal catalyst loading, and the optimal pH was 6.8. In the investigated range of initial concentrations of TCL (0.05-0.38 mM), the photocatalytic degradation in the first stage of the reaction followed approximately a pseudo-first-order kinetics. The increase of LTV-light intensity resulted in a linear increase in the rate of TCL degradation. The figure-of-merit electrical energy per order was employed to estimate the electrical energy consumption. Because the efficiency of TCL photodegradation in the natural thermal water was about two times lower than in distilled water, the investigation encompassed the influence of the thermal water components, i.e. different inorganic ions and humic acid, on the rate of TCL degradation.
PB - American Chemical Society (ACS)
T2 - Industrial and Engineering Chemistry Research
T1 - Degradation of Thiacloprid by ZnO in a Laminar Falling Film Slurry Photocatalytic Reactor
VL - 52
IS - 14
SP - 5040
EP - 5047
DO - 10.1021/ie400194m
ER -
@article{
author = "Abramović, Biljana F. and Banic, Nemanja D. and Krstić, Jugoslav",
year = "2013",
abstract = "The possibility of the use of the laminar falling film slurry type photoreactor was examined in conjunction with ZnO as a photocatalyst for the removal of thiacloprid (TCL) from Calypso 480-SC commercial formulation by UV radiation. The degradation kinetics were monitored by HPLC DAD, while the disappearance of the nitrile group, i.e. TCL and intermediates containing this group, was followed by FTIR The study of TCL removal under different operating conditions indicated that 2 g/L of ZnO was an optimal catalyst loading, and the optimal pH was 6.8. In the investigated range of initial concentrations of TCL (0.05-0.38 mM), the photocatalytic degradation in the first stage of the reaction followed approximately a pseudo-first-order kinetics. The increase of LTV-light intensity resulted in a linear increase in the rate of TCL degradation. The figure-of-merit electrical energy per order was employed to estimate the electrical energy consumption. Because the efficiency of TCL photodegradation in the natural thermal water was about two times lower than in distilled water, the investigation encompassed the influence of the thermal water components, i.e. different inorganic ions and humic acid, on the rate of TCL degradation.",
publisher = "American Chemical Society (ACS)",
journal = "Industrial and Engineering Chemistry Research",
title = "Degradation of Thiacloprid by ZnO in a Laminar Falling Film Slurry Photocatalytic Reactor",
volume = "52",
number = "14",
pages = "5040-5047",
doi = "10.1021/ie400194m"
}
Abramović, B. F., Banic, N. D.,& Krstić, J.. (2013). Degradation of Thiacloprid by ZnO in a Laminar Falling Film Slurry Photocatalytic Reactor. in Industrial and Engineering Chemistry Research
American Chemical Society (ACS)., 52(14), 5040-5047.
https://doi.org/10.1021/ie400194m
Abramović BF, Banic ND, Krstić J. Degradation of Thiacloprid by ZnO in a Laminar Falling Film Slurry Photocatalytic Reactor. in Industrial and Engineering Chemistry Research. 2013;52(14):5040-5047.
doi:10.1021/ie400194m .
Abramović, Biljana F., Banic, Nemanja D., Krstić, Jugoslav, "Degradation of Thiacloprid by ZnO in a Laminar Falling Film Slurry Photocatalytic Reactor" in Industrial and Engineering Chemistry Research, 52, no. 14 (2013):5040-5047,
https://doi.org/10.1021/ie400194m . .
