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dc.creatorJakšić, Zoran
dc.creatorSarajlić, Milija
dc.creatorĐurić, Zoran G.
dc.date.accessioned2019-01-30T17:11:42Z
dc.date.available2019-01-30T17:11:42Z
dc.date.issued2003
dc.identifier.isbn0780379632
dc.identifier.isbn978-078037963-3
dc.identifier.urihttps://cer.ihtm.bg.ac.rs/handle/123456789/130
dc.description.abstractIn this paper we analyze optical modulation by stress-sensitive active elements based on photonic crystals utilizing photoelasticity effects. Our approach is to utilize thin film sensitive elements with photonic bandgap on micromachined silicon diaphragms. We propose two designs, one of them based on 1D Bragg-type dielectric stacks and shaped using conventional photolithography, and the other utilizing nanolithography (scanning probe lithography) to build a photonic bridge structure. In both cases the properties of a built-in defect are modified by stress, resulting in a proportional decrease of the corresponding localized mode peak height. Conventional optical fibers are used for signal readout in our stress-sensitive all-optical modulators.en
dc.publisherIEEE Computer Society
dc.rightsrestrictedAccess
dc.source6th International Conference on Telecommunications in Modern Satellite, Cable and Broadcasting Servi
dc.subjectall-optical modulatorsen
dc.subjectPBGen
dc.subjectphotoelasticityen
dc.subjectphotonic bimdgapen
dc.subjectphotonic crystalsen
dc.titleLight modulation utilizing photonic crystal-based photoelastic elements with dual built-in defecten
dc.typeconferenceObject
dc.rights.licenseARR
dcterms.abstractСарајлић, Милија; Ђурић, Зоран Г.; Јакшић, Зоран;
dc.citation.volume2
dc.citation.spage492
dc.citation.epage495
dc.citation.other2: 492-495
dc.identifier.doi10.1109/TELSKS.2003.1246274
dc.identifier.scopus2-s2.0-84905174143
dc.type.versionpublishedVersion


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Приказ основних података о документу