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Characterization of adsorption-desorption processes on semiconductor surfaces using nanocantilever mass sensors

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2012
Djuric_28MIEL2012.pdf (794.4Kb)
Authors
Đurić, Zoran G.
Radulović, Katarina
Jokić, Ivana
Frantlović, Miloš
Conference object (Published version)
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Abstract
Characterization of adsorption-desorption (AD) processes of gas particles on semiconductors is necessary in order to investigate the influence of these processes on the micro/nano-devices performance. By applying a numerical computational method we determined the pressure dependence of the equilibrium coverage of the semiconductor surface by chemisorbed gas particles. We concluded that the pressure dependence of the total coverage of the surface by adparticles, and also of coverages by both the neutral and ionized adparticles, can be obtained by measuring the adsorbed mass. We propose the use of nanocantilever sensors for such extremely sensitive mass measurements. The obtained adsorption induced cantilever's resonant frequency shifts are higher than the detection threshold set by the termomechanical noise. This confirms the applicability of the used nanocantilever sensor for experimental characterization of AD processes at semiconductor surfaces.
Source:
28th International Conference on Microelectronics - Proceedings, MIEL 2012, 2012, 161-164
Funding / projects:
  • Reinforcement of Regional Microsystems and Nanosystems Centre (EU-205533)
  • Micro- Nanosystems and Sensors for Electric Power and Process Industry and Environmental Protection (RS-32008)

DOI: 10.1109/MIEL.2012.6222823

Scopus: 2-s2.0-84864227934
[ Google Scholar ]
URI
https://cer.ihtm.bg.ac.rs/handle/123456789/1139
Collections
  • Radovi istraživača / Researchers' publications
Institution/Community
IHTM
TY  - CONF
AU  - Đurić, Zoran G.
AU  - Radulović, Katarina
AU  - Jokić, Ivana
AU  - Frantlović, Miloš
PY  - 2012
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/1139
AB  - Characterization of adsorption-desorption (AD) processes of gas particles on semiconductors is necessary in order to investigate the influence of these processes on the micro/nano-devices performance. By applying a numerical computational method we determined the pressure dependence of the equilibrium coverage of the semiconductor surface by chemisorbed gas particles. We concluded that the pressure dependence of the total coverage of the surface by adparticles, and also of coverages by both the neutral and ionized adparticles, can be obtained by measuring the adsorbed mass. We propose the use of nanocantilever sensors for such extremely sensitive mass measurements. The obtained adsorption induced cantilever's resonant frequency shifts are higher than the detection threshold set by the termomechanical noise. This confirms the applicability of the used nanocantilever sensor for experimental characterization of AD processes at semiconductor surfaces.
C3  - 28th International Conference on Microelectronics - Proceedings, MIEL 2012
T1  - Characterization of adsorption-desorption processes on semiconductor surfaces using nanocantilever mass sensors
SP  - 161
EP  - 164
DO  - 10.1109/MIEL.2012.6222823
ER  - 
@conference{
author = "Đurić, Zoran G. and Radulović, Katarina and Jokić, Ivana and Frantlović, Miloš",
year = "2012",
abstract = "Characterization of adsorption-desorption (AD) processes of gas particles on semiconductors is necessary in order to investigate the influence of these processes on the micro/nano-devices performance. By applying a numerical computational method we determined the pressure dependence of the equilibrium coverage of the semiconductor surface by chemisorbed gas particles. We concluded that the pressure dependence of the total coverage of the surface by adparticles, and also of coverages by both the neutral and ionized adparticles, can be obtained by measuring the adsorbed mass. We propose the use of nanocantilever sensors for such extremely sensitive mass measurements. The obtained adsorption induced cantilever's resonant frequency shifts are higher than the detection threshold set by the termomechanical noise. This confirms the applicability of the used nanocantilever sensor for experimental characterization of AD processes at semiconductor surfaces.",
journal = "28th International Conference on Microelectronics - Proceedings, MIEL 2012",
title = "Characterization of adsorption-desorption processes on semiconductor surfaces using nanocantilever mass sensors",
pages = "161-164",
doi = "10.1109/MIEL.2012.6222823"
}
Đurić, Z. G., Radulović, K., Jokić, I.,& Frantlović, M.. (2012). Characterization of adsorption-desorption processes on semiconductor surfaces using nanocantilever mass sensors. in 28th International Conference on Microelectronics - Proceedings, MIEL 2012, 161-164.
https://doi.org/10.1109/MIEL.2012.6222823
Đurić ZG, Radulović K, Jokić I, Frantlović M. Characterization of adsorption-desorption processes on semiconductor surfaces using nanocantilever mass sensors. in 28th International Conference on Microelectronics - Proceedings, MIEL 2012. 2012;:161-164.
doi:10.1109/MIEL.2012.6222823 .
Đurić, Zoran G., Radulović, Katarina, Jokić, Ivana, Frantlović, Miloš, "Characterization of adsorption-desorption processes on semiconductor surfaces using nanocantilever mass sensors" in 28th International Conference on Microelectronics - Proceedings, MIEL 2012 (2012):161-164,
https://doi.org/10.1109/MIEL.2012.6222823 . .

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