Претраживање
Приказ резултата 1-1 од 1
Morphology, Structure and Mechanical Properties of Copper Coatings Electrodeposited by Pulsating Current (PC) Regime on Si(111)
(MDPI, 2020)
Copper electrodeposition on (111)-oriented Si substrate was performed by the pulsating current (PC) regime at various average current densities in the range of 15–70 mA·cm−2, obtained by varying either the frequency (30, ...