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Fundamental aspects of plating technology I: The determination of the optimum deposition current density
(Elsevier, 1983)
It is shown that the optimum plating overpotential or the optimum current density is determined by the upper limit of validity of the Tafel relationship for the deposition process.
Some aspects of current density distribution in electrolytic cells I: Dendritic growth of cadmium at the cathode edge in galvanostatic electrodeposition
(Elsevier, 1983)
The equivalent electrical resistance of a cell with plane parallel electrodes is described by a simple mathematical model. The limits of this model were determined experimentally. The relation between the overpotential at ...
Fundamental aspects of plating technology II: Morphological aspects of metal electrodeposition from complex salt solutions
(Elsevier, 1983)
It is shown that the improved quality of electrodeposits obtained from ammonium complex salt solutions compared with deposits obtained from simple salt solutions is due to the decrease in the exchange current density value ...