Influence of parameters of the pulsating current (PC) regime on morphological, structural and hardness characteristics of copper coatings electrodeposited on Si(111)
Authors
Mladenović, Ivana O.![](/themes/MirageCER/images/orcid.png)
Nikolić, Nebojša D.
![](/themes/MirageCER/images/orcid.png)
Lamovec, Jelena S.
![](/themes/MirageCER/images/orcid.png)
Vasiljević-Radović, Dana
![](/themes/MirageCER/images/orcid.png)
Radojević, Vesna
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Electrodeposition of Cu was performed on Si(111) by the pulsating current (PC) regime in the
range of the average current densities (jav) between 15 and 70 mA cm-2
. The selected values of the
average current densities were attained by varying either pause duration (tp: 28.3, 15, 7.5 and 5 ms,
i.e. jav: 15, 25, 40 and 50 mA cm-2
for the constant values of deposition pulse of 5 ms and current
density amplitude (jA) of 100 mA cm-2) or amplitude of the current density (jA: 120 and 140 mA cm-2
,
i.e. jav: 60 and 70 mA cm-2
for the constant values of deposition pulse of 5 ms and pause duration of
5 ms). Morphological and structural characteristics of the obtained coatings were examined by
scanning electron microscope (SEM), atomic force microscope (AFM) and X-ray diffraction (XRD),
respectively. With increasing the average current density, morphologes of the coatings changed from
those with large and well defined crystal grains obtained at jav of 15 mA cm-2 (the dominant effect... of
activation control) to fine-grained obtained at jav of 50 mA cm-2 (the mixed activation-diffusion
control) and those with globules when diffusion becomes a dominant process (jav = 70 mA cm-2). The
minimum roughness showed the Cu coating obtained at jav of 50 mA cm-2
. Simultaneously, crystal
structure changed from the strong (220) to the strong (111) preferred orientation with increasing
average current density. The change of surface morphology was discussed by the effect of applied
parameters of the PC regime on the type of electrodeposition control, while change in crystal
orientation of produced coatings was explained by various rates of growth on various crystal planes.
Hardness analysis of the produced coatings was performed by application of the Chicot-Lesage (C-L)
composite hardness model. By application of this model, the relative indentation depth (RID; where
RID = h/d; h is an indentation depth, and d is a thickness of coating) of 0.14 was established as the
limiting value separating the area of the absolute hardness of the Cu coatings (RID < 0.14) from the
area in which application of the C-L model is necessary for a determination of the absolute hardness
of coatings (RID > 0.14). For RID < 0.14, the measured composite hardness corresponded to the
absolute hardness of the coating.
Keywords:
electrodeposition / coatingsSource:
Book of abstracts - Ninth international conference on radiation in various fields of research (RAD 2021), 14-18.06.2021, Herceg Novi, Montenegro, 2021, 98-98Publisher:
- Niš, Serbia : RAD Centre
Funding / projects:
- Ministry of Science, Technological Development and Innovation of the Republic of Serbia, institutional funding - 200026 (University of Belgrade, Institute of Chemistry, Technology and Metallurgy - IChTM) (RS-MESTD-inst-2020-200026)
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Institution/Community
IHTMTY - CONF AU - Mladenović, Ivana O. AU - Nikolić, Nebojša D. AU - Lamovec, Jelena S. AU - Vasiljević-Radović, Dana AU - Radojević, Vesna PY - 2021 UR - https://cer.ihtm.bg.ac.rs/handle/123456789/6584 AB - Electrodeposition of Cu was performed on Si(111) by the pulsating current (PC) regime in the range of the average current densities (jav) between 15 and 70 mA cm-2 . The selected values of the average current densities were attained by varying either pause duration (tp: 28.3, 15, 7.5 and 5 ms, i.e. jav: 15, 25, 40 and 50 mA cm-2 for the constant values of deposition pulse of 5 ms and current density amplitude (jA) of 100 mA cm-2) or amplitude of the current density (jA: 120 and 140 mA cm-2 , i.e. jav: 60 and 70 mA cm-2 for the constant values of deposition pulse of 5 ms and pause duration of 5 ms). Morphological and structural characteristics of the obtained coatings were examined by scanning electron microscope (SEM), atomic force microscope (AFM) and X-ray diffraction (XRD), respectively. With increasing the average current density, morphologes of the coatings changed from those with large and well defined crystal grains obtained at jav of 15 mA cm-2 (the dominant effect of activation control) to fine-grained obtained at jav of 50 mA cm-2 (the mixed activation-diffusion control) and those with globules when diffusion becomes a dominant process (jav = 70 mA cm-2). The minimum roughness showed the Cu coating obtained at jav of 50 mA cm-2 . Simultaneously, crystal structure changed from the strong (220) to the strong (111) preferred orientation with increasing average current density. The change of surface morphology was discussed by the effect of applied parameters of the PC regime on the type of electrodeposition control, while change in crystal orientation of produced coatings was explained by various rates of growth on various crystal planes. Hardness analysis of the produced coatings was performed by application of the Chicot-Lesage (C-L) composite hardness model. By application of this model, the relative indentation depth (RID; where RID = h/d; h is an indentation depth, and d is a thickness of coating) of 0.14 was established as the limiting value separating the area of the absolute hardness of the Cu coatings (RID < 0.14) from the area in which application of the C-L model is necessary for a determination of the absolute hardness of coatings (RID > 0.14). For RID < 0.14, the measured composite hardness corresponded to the absolute hardness of the coating. PB - Niš, Serbia : RAD Centre C3 - Book of abstracts - Ninth international conference on radiation in various fields of research (RAD 2021), 14-18.06.2021, Herceg Novi, Montenegro T1 - Influence of parameters of the pulsating current (PC) regime on morphological, structural and hardness characteristics of copper coatings electrodeposited on Si(111) SP - 98 EP - 98 DO - 10.21175/rad.abstr.book.2021.15.14 ER -
@conference{ author = "Mladenović, Ivana O. and Nikolić, Nebojša D. and Lamovec, Jelena S. and Vasiljević-Radović, Dana and Radojević, Vesna", year = "2021", abstract = "Electrodeposition of Cu was performed on Si(111) by the pulsating current (PC) regime in the range of the average current densities (jav) between 15 and 70 mA cm-2 . The selected values of the average current densities were attained by varying either pause duration (tp: 28.3, 15, 7.5 and 5 ms, i.e. jav: 15, 25, 40 and 50 mA cm-2 for the constant values of deposition pulse of 5 ms and current density amplitude (jA) of 100 mA cm-2) or amplitude of the current density (jA: 120 and 140 mA cm-2 , i.e. jav: 60 and 70 mA cm-2 for the constant values of deposition pulse of 5 ms and pause duration of 5 ms). Morphological and structural characteristics of the obtained coatings were examined by scanning electron microscope (SEM), atomic force microscope (AFM) and X-ray diffraction (XRD), respectively. With increasing the average current density, morphologes of the coatings changed from those with large and well defined crystal grains obtained at jav of 15 mA cm-2 (the dominant effect of activation control) to fine-grained obtained at jav of 50 mA cm-2 (the mixed activation-diffusion control) and those with globules when diffusion becomes a dominant process (jav = 70 mA cm-2). The minimum roughness showed the Cu coating obtained at jav of 50 mA cm-2 . Simultaneously, crystal structure changed from the strong (220) to the strong (111) preferred orientation with increasing average current density. The change of surface morphology was discussed by the effect of applied parameters of the PC regime on the type of electrodeposition control, while change in crystal orientation of produced coatings was explained by various rates of growth on various crystal planes. Hardness analysis of the produced coatings was performed by application of the Chicot-Lesage (C-L) composite hardness model. By application of this model, the relative indentation depth (RID; where RID = h/d; h is an indentation depth, and d is a thickness of coating) of 0.14 was established as the limiting value separating the area of the absolute hardness of the Cu coatings (RID < 0.14) from the area in which application of the C-L model is necessary for a determination of the absolute hardness of coatings (RID > 0.14). For RID < 0.14, the measured composite hardness corresponded to the absolute hardness of the coating.", publisher = "Niš, Serbia : RAD Centre", journal = "Book of abstracts - Ninth international conference on radiation in various fields of research (RAD 2021), 14-18.06.2021, Herceg Novi, Montenegro", title = "Influence of parameters of the pulsating current (PC) regime on morphological, structural and hardness characteristics of copper coatings electrodeposited on Si(111)", pages = "98-98", doi = "10.21175/rad.abstr.book.2021.15.14" }
Mladenović, I. O., Nikolić, N. D., Lamovec, J. S., Vasiljević-Radović, D.,& Radojević, V.. (2021). Influence of parameters of the pulsating current (PC) regime on morphological, structural and hardness characteristics of copper coatings electrodeposited on Si(111). in Book of abstracts - Ninth international conference on radiation in various fields of research (RAD 2021), 14-18.06.2021, Herceg Novi, Montenegro Niš, Serbia : RAD Centre., 98-98. https://doi.org/10.21175/rad.abstr.book.2021.15.14
Mladenović IO, Nikolić ND, Lamovec JS, Vasiljević-Radović D, Radojević V. Influence of parameters of the pulsating current (PC) regime on morphological, structural and hardness characteristics of copper coatings electrodeposited on Si(111). in Book of abstracts - Ninth international conference on radiation in various fields of research (RAD 2021), 14-18.06.2021, Herceg Novi, Montenegro. 2021;:98-98. doi:10.21175/rad.abstr.book.2021.15.14 .
Mladenović, Ivana O., Nikolić, Nebojša D., Lamovec, Jelena S., Vasiljević-Radović, Dana, Radojević, Vesna, "Influence of parameters of the pulsating current (PC) regime on morphological, structural and hardness characteristics of copper coatings electrodeposited on Si(111)" in Book of abstracts - Ninth international conference on radiation in various fields of research (RAD 2021), 14-18.06.2021, Herceg Novi, Montenegro (2021):98-98, https://doi.org/10.21175/rad.abstr.book.2021.15.14 . .