Fundamental aspects of pulsating current metal electrodeposition VIII: The effect of pause-to-pulse ratio on microthrowing power of metal deposition
Samo za registrovane korisnike
1984
Članak u časopisu (Objavljena verzija)
Metapodaci
Prikaz svih podataka o dokumentuApstrakt
The effect of a pulsating current on the microthrowing power of metal deposits in the early stage of deposition was investigated by scanning electron microscopy. It is shown that at the same average current density the microthrowing power of metal deposits increases rapidly with increasing pause-to-pulse ratio.
Ključne reči:
Electrodeposition / cadmium plating / pulsating current (PC) / scanning electron microscopyIzvor:
Surface Technology, 1984, 22, 2, 155-158Izdavač:
- Elsevier
Finansiranje / projekti:
- The Research Fund of SR Serbia, Yugoslavia
Institucija/grupa
IHTMTY - JOUR AU - Popov, Konstantin I. AU - Maksimović, Miodrag D. AU - Stevanović, Rade M. AU - Krstajić, Nedeljko V. PY - 1984 UR - https://cer.ihtm.bg.ac.rs/handle/123456789/4433 AB - The effect of a pulsating current on the microthrowing power of metal deposits in the early stage of deposition was investigated by scanning electron microscopy. It is shown that at the same average current density the microthrowing power of metal deposits increases rapidly with increasing pause-to-pulse ratio. PB - Elsevier T2 - Surface Technology T1 - Fundamental aspects of pulsating current metal electrodeposition VIII: The effect of pause-to-pulse ratio on microthrowing power of metal deposition VL - 22 IS - 2 SP - 155 EP - 158 DO - 10.1016/0376-4583(84)90051-7 ER -
@article{ author = "Popov, Konstantin I. and Maksimović, Miodrag D. and Stevanović, Rade M. and Krstajić, Nedeljko V.", year = "1984", abstract = "The effect of a pulsating current on the microthrowing power of metal deposits in the early stage of deposition was investigated by scanning electron microscopy. It is shown that at the same average current density the microthrowing power of metal deposits increases rapidly with increasing pause-to-pulse ratio.", publisher = "Elsevier", journal = "Surface Technology", title = "Fundamental aspects of pulsating current metal electrodeposition VIII: The effect of pause-to-pulse ratio on microthrowing power of metal deposition", volume = "22", number = "2", pages = "155-158", doi = "10.1016/0376-4583(84)90051-7" }
Popov, K. I., Maksimović, M. D., Stevanović, R. M.,& Krstajić, N. V.. (1984). Fundamental aspects of pulsating current metal electrodeposition VIII: The effect of pause-to-pulse ratio on microthrowing power of metal deposition. in Surface Technology Elsevier., 22(2), 155-158. https://doi.org/10.1016/0376-4583(84)90051-7
Popov KI, Maksimović MD, Stevanović RM, Krstajić NV. Fundamental aspects of pulsating current metal electrodeposition VIII: The effect of pause-to-pulse ratio on microthrowing power of metal deposition. in Surface Technology. 1984;22(2):155-158. doi:10.1016/0376-4583(84)90051-7 .
Popov, Konstantin I., Maksimović, Miodrag D., Stevanović, Rade M., Krstajić, Nedeljko V., "Fundamental aspects of pulsating current metal electrodeposition VIII: The effect of pause-to-pulse ratio on microthrowing power of metal deposition" in Surface Technology, 22, no. 2 (1984):155-158, https://doi.org/10.1016/0376-4583(84)90051-7 . .