Effect of parameters of pulsating current (PC) regimes on morphology of electrodeposited copper in hydrogen co-deposition range
Конференцијски прилог (Објављена верзија)
Метаподаци
Приказ свих података о документуАпстракт
The most often employed electrolytes for the electrodeposition of copper are those based on aqueous solutions of sulfuric acid (H2SO4) and cupric sulfate (CuSO4). There is an ionic equilibrium of a lot of species in the CuSO4-H2SO4-H2O system. Electrodeposition processes at high current densities and overpotentials are very suitable for experimental verification of this ionic equilibrium, because there is parallelism between copper electrodeposition and hydrogen evolution reaction at high current densities and overpotentials. In this study, it is shown that effects attained by the choice of appropriate parameters of square-waves pulsating current (PC) on morphology of electrodeposited copper were equivalent to those obtained by electrodepositions at the constant overpotential in the hydrogen co-deposition range from six solutions of different concentrations of CuSO4 and H2SO4. In this way, it was clear that it is possible to simulate the ionic equilibrium of the species in the CuSO4-H2...SO4-H2O system using the only one electroplating solution if the appropriate parameters of PC regimes are used.
Кључне речи:
Electrodeposited copper / Electrodeposition / MorphologyИзвор:
Second Regional Symposium on Electrochemistry South-East Europe, RSE-SEE, Program and Book of Abstracts, 2010, 135-135Издавач:
- Serbian Chemical Society, Belgrade
Напомена:
- Belgrade, Serbia, June 6-10, 2010
Институција/група
IHTMTY - CONF AU - Nikolić, Nebojša D. AU - Branković, Goran AU - Pavlović, Miomir PY - 2010 UR - http://www.aseee.eu/index.php/rsesee2-home UR - https://cer.ihtm.bg.ac.rs/handle/123456789/3529 AB - The most often employed electrolytes for the electrodeposition of copper are those based on aqueous solutions of sulfuric acid (H2SO4) and cupric sulfate (CuSO4). There is an ionic equilibrium of a lot of species in the CuSO4-H2SO4-H2O system. Electrodeposition processes at high current densities and overpotentials are very suitable for experimental verification of this ionic equilibrium, because there is parallelism between copper electrodeposition and hydrogen evolution reaction at high current densities and overpotentials. In this study, it is shown that effects attained by the choice of appropriate parameters of square-waves pulsating current (PC) on morphology of electrodeposited copper were equivalent to those obtained by electrodepositions at the constant overpotential in the hydrogen co-deposition range from six solutions of different concentrations of CuSO4 and H2SO4. In this way, it was clear that it is possible to simulate the ionic equilibrium of the species in the CuSO4-H2SO4-H2O system using the only one electroplating solution if the appropriate parameters of PC regimes are used. PB - Serbian Chemical Society, Belgrade C3 - Second Regional Symposium on Electrochemistry South-East Europe, RSE-SEE, Program and Book of Abstracts T1 - Effect of parameters of pulsating current (PC) regimes on morphology of electrodeposited copper in hydrogen co-deposition range SP - 135 EP - 135 UR - https://hdl.handle.net/21.15107/rcub_cer_3529 ER -
@conference{ author = "Nikolić, Nebojša D. and Branković, Goran and Pavlović, Miomir", year = "2010", abstract = "The most often employed electrolytes for the electrodeposition of copper are those based on aqueous solutions of sulfuric acid (H2SO4) and cupric sulfate (CuSO4). There is an ionic equilibrium of a lot of species in the CuSO4-H2SO4-H2O system. Electrodeposition processes at high current densities and overpotentials are very suitable for experimental verification of this ionic equilibrium, because there is parallelism between copper electrodeposition and hydrogen evolution reaction at high current densities and overpotentials. In this study, it is shown that effects attained by the choice of appropriate parameters of square-waves pulsating current (PC) on morphology of electrodeposited copper were equivalent to those obtained by electrodepositions at the constant overpotential in the hydrogen co-deposition range from six solutions of different concentrations of CuSO4 and H2SO4. In this way, it was clear that it is possible to simulate the ionic equilibrium of the species in the CuSO4-H2SO4-H2O system using the only one electroplating solution if the appropriate parameters of PC regimes are used.", publisher = "Serbian Chemical Society, Belgrade", journal = "Second Regional Symposium on Electrochemistry South-East Europe, RSE-SEE, Program and Book of Abstracts", title = "Effect of parameters of pulsating current (PC) regimes on morphology of electrodeposited copper in hydrogen co-deposition range", pages = "135-135", url = "https://hdl.handle.net/21.15107/rcub_cer_3529" }
Nikolić, N. D., Branković, G.,& Pavlović, M.. (2010). Effect of parameters of pulsating current (PC) regimes on morphology of electrodeposited copper in hydrogen co-deposition range. in Second Regional Symposium on Electrochemistry South-East Europe, RSE-SEE, Program and Book of Abstracts Serbian Chemical Society, Belgrade., 135-135. https://hdl.handle.net/21.15107/rcub_cer_3529
Nikolić ND, Branković G, Pavlović M. Effect of parameters of pulsating current (PC) regimes on morphology of electrodeposited copper in hydrogen co-deposition range. in Second Regional Symposium on Electrochemistry South-East Europe, RSE-SEE, Program and Book of Abstracts. 2010;:135-135. https://hdl.handle.net/21.15107/rcub_cer_3529 .
Nikolić, Nebojša D., Branković, Goran, Pavlović, Miomir, "Effect of parameters of pulsating current (PC) regimes on morphology of electrodeposited copper in hydrogen co-deposition range" in Second Regional Symposium on Electrochemistry South-East Europe, RSE-SEE, Program and Book of Abstracts (2010):135-135, https://hdl.handle.net/21.15107/rcub_cer_3529 .