Diagnostic of silicon piezoresistive pressure sensors by low frequency noise measurements
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2008
Članak u časopisu (Objavljena verzija)
Metapodaci
Prikaz svih podataka o dokumentuApstrakt
Low frequency noise measurements can be used as a tool in diagnostics of silicon diaphragm-based piezoresistive pressure sensors after the sensor encapsulation and oil filling process are finished. We measured noise in piezoresistors comprising the Wheatstone bridge of the sensor. Our results show that oil filling process causes a noise decrease, particularly in the low frequency range. This is correlated with the oxide quality and the concentration of surrounding ions above the free oxide surface, as well with the fluctuation of adsorption-desorption (AD) processes of charged particles at the free oxide surface and trapping/detrapping processes at the oxide/silicon interface. A model for the piezoresistor noise due to fluctuations caused by the AD processes and a criterion for screening the sensors based on noise measurements are proposed.
Ključne reči:
Noise / Noise diagnostic / Piezoresistors / Pressure sensors / Silicon sensorsIzvor:
Sensors and Actuators, A: Physical, 2008, 144, 2, 267-274Finansiranje / projekti:
- Serbian Ministry of Science (TR-6116B)
- Serbian Ministry of Science (TR-6101B)
DOI: 10.1016/j.sna.2008.02.002
ISSN: 0924-4247
WoS: 000256896700005
Scopus: 2-s2.0-43849104628
Institucija/grupa
IHTMTY - JOUR AU - Jevtić, Milan M. AU - Smiljanić, Miloljub PY - 2008 UR - https://cer.ihtm.bg.ac.rs/handle/123456789/477 AB - Low frequency noise measurements can be used as a tool in diagnostics of silicon diaphragm-based piezoresistive pressure sensors after the sensor encapsulation and oil filling process are finished. We measured noise in piezoresistors comprising the Wheatstone bridge of the sensor. Our results show that oil filling process causes a noise decrease, particularly in the low frequency range. This is correlated with the oxide quality and the concentration of surrounding ions above the free oxide surface, as well with the fluctuation of adsorption-desorption (AD) processes of charged particles at the free oxide surface and trapping/detrapping processes at the oxide/silicon interface. A model for the piezoresistor noise due to fluctuations caused by the AD processes and a criterion for screening the sensors based on noise measurements are proposed. T2 - Sensors and Actuators, A: Physical T1 - Diagnostic of silicon piezoresistive pressure sensors by low frequency noise measurements VL - 144 IS - 2 SP - 267 EP - 274 DO - 10.1016/j.sna.2008.02.002 ER -
@article{ author = "Jevtić, Milan M. and Smiljanić, Miloljub", year = "2008", abstract = "Low frequency noise measurements can be used as a tool in diagnostics of silicon diaphragm-based piezoresistive pressure sensors after the sensor encapsulation and oil filling process are finished. We measured noise in piezoresistors comprising the Wheatstone bridge of the sensor. Our results show that oil filling process causes a noise decrease, particularly in the low frequency range. This is correlated with the oxide quality and the concentration of surrounding ions above the free oxide surface, as well with the fluctuation of adsorption-desorption (AD) processes of charged particles at the free oxide surface and trapping/detrapping processes at the oxide/silicon interface. A model for the piezoresistor noise due to fluctuations caused by the AD processes and a criterion for screening the sensors based on noise measurements are proposed.", journal = "Sensors and Actuators, A: Physical", title = "Diagnostic of silicon piezoresistive pressure sensors by low frequency noise measurements", volume = "144", number = "2", pages = "267-274", doi = "10.1016/j.sna.2008.02.002" }
Jevtić, M. M.,& Smiljanić, M.. (2008). Diagnostic of silicon piezoresistive pressure sensors by low frequency noise measurements. in Sensors and Actuators, A: Physical, 144(2), 267-274. https://doi.org/10.1016/j.sna.2008.02.002
Jevtić MM, Smiljanić M. Diagnostic of silicon piezoresistive pressure sensors by low frequency noise measurements. in Sensors and Actuators, A: Physical. 2008;144(2):267-274. doi:10.1016/j.sna.2008.02.002 .
Jevtić, Milan M., Smiljanić, Miloljub, "Diagnostic of silicon piezoresistive pressure sensors by low frequency noise measurements" in Sensors and Actuators, A: Physical, 144, no. 2 (2008):267-274, https://doi.org/10.1016/j.sna.2008.02.002 . .