Fundamental aspects of pulsating current metal electrodeposition VIII: The effect of pause-to-pulse ratio on microthrowing power of metal deposition
Само за регистроване кориснике
1984
Чланак у часопису (Објављена верзија)
Метаподаци
Приказ свих података о документуАпстракт
The effect of a pulsating current on the microthrowing power of metal deposits in the early stage of deposition was investigated by scanning electron microscopy. It is shown that at the same average current density the microthrowing power of metal deposits increases rapidly with increasing pause-to-pulse ratio.
Кључне речи:
Electrodeposition / cadmium plating / pulsating current (PC) / scanning electron microscopyИзвор:
Surface Technology, 1984, 22, 2, 155-158Издавач:
- Elsevier
Финансирање / пројекти:
- The Research Fund of SR Serbia, Yugoslavia
Институција/група
IHTMTY - JOUR AU - Popov, Konstantin I. AU - Maksimović, Miodrag D. AU - Stevanović, Rade M. AU - Krstajić, Nedeljko V. PY - 1984 UR - https://cer.ihtm.bg.ac.rs/handle/123456789/4433 AB - The effect of a pulsating current on the microthrowing power of metal deposits in the early stage of deposition was investigated by scanning electron microscopy. It is shown that at the same average current density the microthrowing power of metal deposits increases rapidly with increasing pause-to-pulse ratio. PB - Elsevier T2 - Surface Technology T1 - Fundamental aspects of pulsating current metal electrodeposition VIII: The effect of pause-to-pulse ratio on microthrowing power of metal deposition VL - 22 IS - 2 SP - 155 EP - 158 DO - 10.1016/0376-4583(84)90051-7 ER -
@article{ author = "Popov, Konstantin I. and Maksimović, Miodrag D. and Stevanović, Rade M. and Krstajić, Nedeljko V.", year = "1984", abstract = "The effect of a pulsating current on the microthrowing power of metal deposits in the early stage of deposition was investigated by scanning electron microscopy. It is shown that at the same average current density the microthrowing power of metal deposits increases rapidly with increasing pause-to-pulse ratio.", publisher = "Elsevier", journal = "Surface Technology", title = "Fundamental aspects of pulsating current metal electrodeposition VIII: The effect of pause-to-pulse ratio on microthrowing power of metal deposition", volume = "22", number = "2", pages = "155-158", doi = "10.1016/0376-4583(84)90051-7" }
Popov, K. I., Maksimović, M. D., Stevanović, R. M.,& Krstajić, N. V.. (1984). Fundamental aspects of pulsating current metal electrodeposition VIII: The effect of pause-to-pulse ratio on microthrowing power of metal deposition. in Surface Technology Elsevier., 22(2), 155-158. https://doi.org/10.1016/0376-4583(84)90051-7
Popov KI, Maksimović MD, Stevanović RM, Krstajić NV. Fundamental aspects of pulsating current metal electrodeposition VIII: The effect of pause-to-pulse ratio on microthrowing power of metal deposition. in Surface Technology. 1984;22(2):155-158. doi:10.1016/0376-4583(84)90051-7 .
Popov, Konstantin I., Maksimović, Miodrag D., Stevanović, Rade M., Krstajić, Nedeljko V., "Fundamental aspects of pulsating current metal electrodeposition VIII: The effect of pause-to-pulse ratio on microthrowing power of metal deposition" in Surface Technology, 22, no. 2 (1984):155-158, https://doi.org/10.1016/0376-4583(84)90051-7 . .