The effect of current density, deoisition time and electrolytic pH value on roughness of copper coatings

Abstract

The copper coatings were electrodeposited directly onto aluminium from the bath: (CuSO4 (55 g/dm3) + CH2 NH2 - CH2OH (100g/ dm3) + (NH4)2SO4 (30 g/dm3) + Na2SO4(10H2O (75g/dm3) + Na2CO3 (3g/dm3), room temperature, j = 0.3 - 0.8 A/dm2, pH = 10.3-8.5. The copper coatings deposited onto Al show good adhesion. Removal of passive oxide film from aluminium surface was chemically accomplished in solutions 1-4. The effect of current density, deposition time and electrolytic pH on roughness of copper coatings were studied. Roughness of Cu coatings was measured by TR200.

Prevlake bakra taložene su neposredno galvanostatskim putem na aluminijum iz kupatila sastava: [CuSO4 (55 g/dm3) + CH2 NH2 - CH2OH (100 g/dm3) + (NH4)2SO4 (30 g/ dm3) + Na2SO4(10H2O (75 g/dm3) + Na2CO3 (3 g/dm3], temperatura sobna j =0,3-0,8A/dm2, pH = 10,3-8.5. Istaložene prevlake bakra na aluminijumu imaju dobru adheziju. Uklanjanje pasivne oksidne opne sa površine aluminijuma vršeno je hemijski u rastvorima 1-4. Ispitivan je uticaj gustine struje vremena taloženja i pH-vrednosti elektrolita na hrapavost prevlaka bakra. Merenje hrapavosti prevlaka bakra vršeno je pomoću uređaja TR200.