Metal layers with subwavelength texturing for broadband enhancement of photocatalytic processes in microreactors
Само за регистроване кориснике
2018
Аутори
Rašljić, MilenaObradov, Marko
Lazić, Žarko
Vasiljević-Radović, Dana
Čupić, Željko
Stanisavljev, Dragomir
Чланак у часопису (Објављена верзија)
Метаподаци
Приказ свих података о документуАпстракт
In this paper we joined plasmonics and microreactors for photocatalytic optofluidic devices. To this purpose we consider the use of subwavelength texturing of plasmonic films applied to microreactor channel bottom to ensure SPP localization and field enhancement. The small volume of the microchannel is ideal for the enhancement of photocatalytic processes using localized evanescent fields. A great advantage of our approach is that it is highly compatible with the standard chemical bulk micromachining techniques which are commonly used in fabrication of the microreactors i.e. standard photolithography can be used to define microchannels, and radiofrequent sputtering to deposit a gold film as a plasmonic material over the roughened surface. Subwavelength surface texturing can be obtained by varying etching techniques and parameters and the microreactor building materials. We show using ab initio FEM modeling that the stochastic surface profile ensures broadband coupling of visible light ...as well as enables us to merge plasmonic sensors and microreactors into a single device.
Кључне речи:
Plasmonic / Microreactors / Thin films / PhotocatalysisИзвор:
Optical and Quantum Electronics, 2018, 50, 6, 237-Издавач:
- Springer
Финансирање / пројекти:
DOI: 10.1007/s11082-018-1507-z
ISSN: 0306-8919
WoS: 000433163200001
Scopus: 2-s2.0-85047537402
Институција/група
IHTMTY - JOUR AU - Rašljić, Milena AU - Obradov, Marko AU - Lazić, Žarko AU - Vasiljević-Radović, Dana AU - Čupić, Željko AU - Stanisavljev, Dragomir PY - 2018 UR - https://cer.ihtm.bg.ac.rs/handle/123456789/2481 AB - In this paper we joined plasmonics and microreactors for photocatalytic optofluidic devices. To this purpose we consider the use of subwavelength texturing of plasmonic films applied to microreactor channel bottom to ensure SPP localization and field enhancement. The small volume of the microchannel is ideal for the enhancement of photocatalytic processes using localized evanescent fields. A great advantage of our approach is that it is highly compatible with the standard chemical bulk micromachining techniques which are commonly used in fabrication of the microreactors i.e. standard photolithography can be used to define microchannels, and radiofrequent sputtering to deposit a gold film as a plasmonic material over the roughened surface. Subwavelength surface texturing can be obtained by varying etching techniques and parameters and the microreactor building materials. We show using ab initio FEM modeling that the stochastic surface profile ensures broadband coupling of visible light as well as enables us to merge plasmonic sensors and microreactors into a single device. PB - Springer T2 - Optical and Quantum Electronics T1 - Metal layers with subwavelength texturing for broadband enhancement of photocatalytic processes in microreactors VL - 50 IS - 6 SP - 237 DO - 10.1007/s11082-018-1507-z ER -
@article{ author = "Rašljić, Milena and Obradov, Marko and Lazić, Žarko and Vasiljević-Radović, Dana and Čupić, Željko and Stanisavljev, Dragomir", year = "2018", abstract = "In this paper we joined plasmonics and microreactors for photocatalytic optofluidic devices. To this purpose we consider the use of subwavelength texturing of plasmonic films applied to microreactor channel bottom to ensure SPP localization and field enhancement. The small volume of the microchannel is ideal for the enhancement of photocatalytic processes using localized evanescent fields. A great advantage of our approach is that it is highly compatible with the standard chemical bulk micromachining techniques which are commonly used in fabrication of the microreactors i.e. standard photolithography can be used to define microchannels, and radiofrequent sputtering to deposit a gold film as a plasmonic material over the roughened surface. Subwavelength surface texturing can be obtained by varying etching techniques and parameters and the microreactor building materials. We show using ab initio FEM modeling that the stochastic surface profile ensures broadband coupling of visible light as well as enables us to merge plasmonic sensors and microreactors into a single device.", publisher = "Springer", journal = "Optical and Quantum Electronics", title = "Metal layers with subwavelength texturing for broadband enhancement of photocatalytic processes in microreactors", volume = "50", number = "6", pages = "237", doi = "10.1007/s11082-018-1507-z" }
Rašljić, M., Obradov, M., Lazić, Ž., Vasiljević-Radović, D., Čupić, Ž.,& Stanisavljev, D.. (2018). Metal layers with subwavelength texturing for broadband enhancement of photocatalytic processes in microreactors. in Optical and Quantum Electronics Springer., 50(6), 237. https://doi.org/10.1007/s11082-018-1507-z
Rašljić M, Obradov M, Lazić Ž, Vasiljević-Radović D, Čupić Ž, Stanisavljev D. Metal layers with subwavelength texturing for broadband enhancement of photocatalytic processes in microreactors. in Optical and Quantum Electronics. 2018;50(6):237. doi:10.1007/s11082-018-1507-z .
Rašljić, Milena, Obradov, Marko, Lazić, Žarko, Vasiljević-Radović, Dana, Čupić, Željko, Stanisavljev, Dragomir, "Metal layers with subwavelength texturing for broadband enhancement of photocatalytic processes in microreactors" in Optical and Quantum Electronics, 50, no. 6 (2018):237, https://doi.org/10.1007/s11082-018-1507-z . .