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Response Surface Methodology and Artificial Neural Network-Based Models for Predicting Roughness of Cu coatings
(Belgrade: ETRAN – Society for electronics, telecommunication, computing, automatics and nuclear angineering, 2020)
Copper coatings are produced on silicon wafer by electrodeposition (ED) in pulsating current (PC) regime. Electrodeposition was performed at various current density amplitudes in the range of 80−140 mA cm-2, frequency in ...
Electrochemical investigation of lateritic ore leachates for metal ions extraction
(Belgrade : Serbian Society of Corrosion and Materials Protection UISKOZAM, 2021)
Electrochemical measurements were employed to study the possibility of the extraction of metal ions from lateritic ore leachates predominantly rich in Fe in order to separate more noble cobalt and nickel metals. Lateritic ...
Morphology of aluminium electrodeposited on aluminium from AlCl3+urea solvate ionic liquid
(Society of Physical Chemists of Serbia, 2021)
The ionic liquid, made of urea and AlCl3, known as deep eutectic solvent (DESs) has already shown to be low‐cost electrolyte suitable for aluminum electrodeposition. By applying appropriate potentiostatic or galvanostatic ...
Influence of parameters of the pulsating current (PC) regime on morphological, structural and hardness characteristics of copper coatings electrodeposited on Si(111)
(Niš, Serbia : RAD Centre, 2021)
Electrodeposition of Cu was performed on Si(111) by the pulsating current (PC) regime in the
range of the average current densities (jav) between 15 and 70 mA cm-2
. The selected values of the
average current densities ...